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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Au etch: Difference between revisions

Bghe (talk | contribs)
Bghe (talk | contribs)
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!Etch rate in resist
!Etch rate in resist
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*<nowiki>#</nowiki> small samples
12.8nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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*<nowiki>#</nowiki> small samples
72nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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!Etch rate in Au
!Etch rate in Au
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*Allowed material 1
32.7nm/min
*Allowed material 2
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*Allowed material 1
42.6nm/min
*Allowed material 2
*Allowed material 3
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Etch rate in Ti
!Etch rate in Ti
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*<nowiki>#</nowiki> small samples
8.3nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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*<nowiki>#</nowiki> small samples
4.3nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Selectivity Zep/Ti
!Selectivity Ti/Zep
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*Allowed material 1
0.65
*Allowed material 2
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*Allowed material 1
0.06
*Allowed material 2
*Allowed material 3
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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Selectivity Au/Ti
!Selectivity Au/Ti
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*<nowiki>#</nowiki> small samples
3.9nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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*<nowiki>#</nowiki> small samples
9.9nm/min
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers


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