Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography#top|Go to top of this page]]</span> | ||
To request for an e-beam training session, contact [[mailto:e-beam@danchip.dtu.dk|e-beam@danchip.dtu.dk]]; a DTU Danchip personnel will hereafter provide a time slot. Users require at least 4 training sessions before being allowed full acccess to the machine. | |||
For safety reasons, even fully trained users are only authorizedd to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | For safety reasons, even fully trained users are only authorizedd to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | ||
There are two daily loading sessions where cassettes will be loaded into the autoloader by DTu Danchip personel: | |||
There are two daily loading sessions: | |||
10:00 - 10:30 | *10:00 - 10:30 | ||
13:30 - 14:00 | *13:30 - 14:00 | ||
To use the e-beam writer, book the machine via LabManager, show up to the loading session before your exposure to mount your substrate and pre-align if necessary. | To use the e-beam writer, book the machine via LabManager, show up to the loading session before your exposure to mount your substrate and pre-align if necessary. | ||
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader. | |||
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an empty cassette into the autoloader. | |||
If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates. | If you are prohibited to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Danchip personel unmount your substrates. | ||
Before you request for a training, it is crucial to have your pattern ready in either tdb-format or GDSII format. Also, check your pattern in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> before requesting. In order to reach the files from the computers inside the cleanroom, it is recommended to either dropbox them or send them per email to yourself. | Before you request for a training, it is crucial to have your pattern ready in either tdb-format or GDSII format. Also, check your pattern in e.g. <span class="plainlinks">[http://www.wieweb.com/ns6/index.html CleWin]</span> before requesting. In order to reach the files from the computers inside the cleanroom, it is recommended to either dropbox them or send them per email to yourself. | ||