Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/Etch slow: Difference between revisions
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!Si etch test2 | !Si etch test2 | ||
!Si etch test3 | !Si etch test3 | ||
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!Important note | |||
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|This recipe must only be run for 5 min, otherwise the beam acc. current will incrase above 20 | |||
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|Neutalizer current [mA] | |Neutalizer current [mA] | ||