Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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=UV Lithography Equipment= | |||
===[[Specific Process Knowledge/Lithography/Pretreatment|Pretreatment]]=== | |||
*[[Specific Process Knowledge/Lithography/Pretreatment#HMDS|HMDS]] | |||
*[[Specific Process Knowledge/Lithography/Pretreatment#BHF|BHF]] | |||
*[[Specific Process Knowledge/Lithography/Pretreatment#250_C_oven_for_pretreatment|250C Oven for Pretreatment]] | |||
===[[Specific Process Knowledge/Lithography/Coaters|Coaters]]=== | |||
*[[Specific Process Knowledge/Lithography/Coaters#SSE Spinner|SSE Spinner]] | |||
*[[Specific Process Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | |||
*[[Specific Process Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | |||
*[[Specific Process Knowledge/Lithography/Coaters#Manual Spinner (Polymers)|Manual Spinner (Polymers)]] | |||
*[[Specific Process Knowledge/Lithography/Coaters#Manual Spinner 1 (Laurell)|Manual Spinner 1 (Laurell)]] | |||
*[[Specific Process Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |||
*[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]] | |||
===[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure]]=== | |||
*[[Specific Process Knowledge/Lithography/UVExposure#KS Aligner|KS Aligner]] | |||
*[[Specific Process Knowledge/Lithography/UVExposure#EVG Aligner|EVG Aligner]] | |||
*[[Specific Process Knowledge/Lithography/UVExposure#III-V Aligner|III-V Aligner]] | |||
*[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | |||
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===[[Specific Process Knowledge/Lithography/Baking|Baking]]=== | |||
*[[Specific Process Knowledge/Lithography/Baking#Hotplates|Hotplates]] | |||
*[[Specific Process Knowledge/Lithography/Baking#Ovens|Ovens]] | |||
===[[Specific Process Knowledge/Lithography/Development|Development]]=== | |||
===[[Specific Process Knowledge/Lithography/Strip|Strip]]=== | |||
*[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 1|Plasma Asher 1]] | |||
*[[Specific Process Knowledge/Lithography/Strip#Plasma Asher 2|Plasma Asher 2]] | |||
*[[Specific Process Knowledge/Lithography/Strip#III-V Plasma Asher|III-V Plasma Asher]] | |||
*[[Specific Process Knowledge/Lithography/Strip#Rough Acetone Strip|Rough Acetone Strip]] | |||
*[[Specific Process Knowledge/Lithography/Strip#Fine Acetone Strip|Fine Acetone Strip]] | |||
===[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]=== | |||
*[[Specific Process Knowledge/Lithography/LiftOff#LiftOffWetBench|Lift-off Wet Bench]] | |||
*[[Specific Process Knowledge/Lithography/LiftOff#LiftOff(4",6")|Lift-off (4", 6")]] | |||
===[[Specific Process Knowledge/Lithography/WaferCleaning|Wafer Cleaning]]=== | |||
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