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| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
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| |-style="background:silver; color:black"
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| ![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Resist]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Comments]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Pre-treatment]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Resist Coating]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Exposure]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Baking]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Developing]]
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| ![[Specific Process Knowledge/Thin film deposition/PECVD|Stripping, Lift-off]]
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |AA
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| |AA
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| |-style="background:LightGrey; color:black"
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| |BB
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| |-style="background:WhiteSmoke; color:black"
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| |CC
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| |CC
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| |}
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| <br clear="all" />
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| = Resist Overview = | | = Resist Overview = |
