Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 194: | Line 194: | ||
|Negative | |Negative | ||
|DOW Corning | |DOW Corning | ||
| | |Approved. Standard negative resist, mainly for III-V materials | ||
| | | | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
| Line 208: | Line 208: | ||
|Negative | |Negative | ||
|Micro Resist | |Micro Resist | ||
| | |Approved. Standard negative resist. | ||
| | | | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||