Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

@@ Line 437: / Line 437: @@
 |All materials
 |All materials
+|-
+===SiO etching bath===
+{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
+|-
+|-style="background:silver; color:black"
+!
+! SiO tank
+|-
+|-style="background:WhiteSmoke; color:black"
+!Batch size!
+|1-25 wafers at a time
+|-
+|-style="background:LightGrey; color:black"
+!Size of substrate
+|4" wafers
+|-
+|-style="background:WhiteSmoke; color:black"
+!Allowed materials
+|
+*Silicon
+*Poly silicon
+*Silicon nitrides
+*Silicon oxynitrides
+*Silicon oxides
+*Photoresist
 |-
 |}