Jump to content

Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

Kabi (talk | contribs)
Kabi (talk | contribs)
Line 341: Line 341:
*Silicon Oxynitride
*Silicon Oxynitride
*Photoresist
*Photoresist
*E-beam resist
*Blue film
|
|
*Silicon
*Silicon
Line 349: Line 349:
*Silicon Oxynitride
*Silicon Oxynitride
*Photoresist
*Photoresist
*E-beam resist
*Blue film
|
|
*Silicon
*Silicon
Line 356: Line 356:
*Silicon Nitride
*Silicon Nitride
*Silicon Oxynitride
*Silicon Oxynitride
*Photoresist
*E-beam resist
|
|
*Silicon
*Silicon