Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
Appearance
| Line 341: | Line 341: | ||
*Silicon Oxynitride | *Silicon Oxynitride | ||
*Photoresist | *Photoresist | ||
* | *Blue film | ||
| | | | ||
*Silicon | *Silicon | ||
| Line 349: | Line 349: | ||
*Silicon Oxynitride | *Silicon Oxynitride | ||
*Photoresist | *Photoresist | ||
* | *Blue film | ||
| | | | ||
*Silicon | *Silicon | ||
| Line 356: | Line 356: | ||
*Silicon Nitride | *Silicon Nitride | ||
*Silicon Oxynitride | *Silicon Oxynitride | ||
| | | | ||
*Silicon | *Silicon | ||