Jump to content

Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

← Older editNewer edit →
VisualWikitext
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Line 213: Line 213:
*:[http://kemibrug.dk/KBA/CAS/106534/?show_KBA=1&portaldesign=1 see KBA here]
*:[http://kemibrug.dk/KBA/CAS/106534/?show_KBA=1&portaldesign=1 see KBA here]
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
|style="background:LightGrey; color:black"|Isotropic
|style="background:LightGrey; color:black"|Isotropic
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Line 238: Line 238:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*A little higher etch rates than BHF
*A little higher etch rates than BHF
|-
|style="background:LightGrey; color:black"|Lifetime of photoresist
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
Line 260: Line 270:
*Room temperature
*Room temperature
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Substrates
|style="background:LightGrey; color:black"|Masking material
|style="background:LightGrey; color:black"|Masking material
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
Line 283: Line 293:
*photoresist
*photoresist
*Blue film
*Blue film
|-
|style="background:LightGrey; color:black"|Lifetime of photoresist
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|style="background:WhiteSmoke; color:black"|
*~½ hour
|-
|-
|}
|}


<br clear="all" />
<br clear="all" />
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)"