Specific Process Knowledge/Etch/KOH Etch: Difference between revisions
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range | ||
|style="background:LightGrey; color:black"|Chemical solution | |style="background:LightGrey; color:black"|Chemical solution | ||
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*Custom made | *Custom made | ||
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|style="background:LightGrey; color:black"|Temperature | |||
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*Max 80 °C (standard etch) | |||
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*Max 80 °C (standard etch) | |||
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*Max 70 °C if IPA added | |||
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*Max 80 °C | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Substrates | ||