Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
No edit summary |
|||
| Line 125: | Line 125: | ||
| | | | ||
| | | | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
| | | | ||
| | | | ||
| Line 139: | Line 139: | ||
| | | | ||
| | | | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]] | ||
| | | | ||
| | | | ||
| Line 148: | Line 148: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''AZ MiR 701''' | |'''AZ MiR 701''' | ||
|Positive | |||
| | | | ||
| | | | ||
| | | | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]] | ||
| | | | ||
| | | | ||
Revision as of 08:12, 12 August 2013
| Process | Resist Type | Comment 1 | Comment 2 | Comment 3 |
|---|---|---|---|---|
| Lift off | NLOF | AA | BB | CC |
| Dry Etch | DD
|
EE | FF | GG |
| Wet Etch | HH
|
II | JJ | KK |
| Resist | Comments | Pre-treatment | Resist Coating | Exposure | Baking | Developing | Stripping, Lift-off |
|---|---|---|---|---|---|---|---|
| AA | AA | AA | AA | AA | AA | AA | AA |
| BB | BB | BB | BB | BB | BB | BB | BB |
| CC | CC | CC | CC | CC | CC | CC | CC |
Resist Overview
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| AZ5214E | Positive | SSE, KS Spinner |
| ||||||
| AZ4562 | Positive | SSE, KS Spinner | |||||||
| AZ MiR 701 | Positive | Spin Track 1 + 2 | |||||||
| AZ nLOF 2020 | Negative |
| |||||||
| SU8 | Positive |
|