Specific Process Knowledge/Lithography/Baking: Difference between revisions
Created page with "==90 C 4" hotplate== 200x200px|thumb|Hotplate 90 degrees: positioned in cleanroom 3 Hotplate is mostly used for baking of single wafer ..." |
No edit summary |
||
| Line 1: | Line 1: | ||
= Hotplates = | |||
==90 C 4" hotplate== | ==90 C 4" hotplate== | ||
[[Image:90_degrees_hotplate_cr3.jpg|200x200px|thumb|Hotplate 90 degrees: positioned in cleanroom 3]] | [[Image:90_degrees_hotplate_cr3.jpg|200x200px|thumb|Hotplate 90 degrees: positioned in cleanroom 3]] | ||
| Line 9: | Line 12: | ||
<br clear="all" /> | <br clear="all" /> | ||
==SU8 hotplates== | ==SU8 hotplates== | ||
