Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 ==III-V Spinner==
-[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]]
+The III-V spinner is a SÜSS RC8 Spin Coater intended for processing of III-V compound semiconductors and CMOS compatible materals. Please note, that '''there are different chucks for III-V materials and CMOS compatible materials.''' The spinner is mounted in a laminar flow hood located in the III-V laboratory (yellow room).
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+[[Image:3-5 spinner.jpg|300x300px|thumb|III-V Aligner positioned in III-V cleanroom ]]
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+{| border="2" cellspacing="0" cellpadding="10"
+|-
+!style="background:silver; color:black" align="left" valign="top" rowspan="4"|Performance
+|style="background:LightGrey; color:black"|Maximum speed
+|style="background:WhiteSmoke; color:black"|
+*Cover closed: 7000 rpm
+*Cover open: 1000 rpm
+* Gyrset: 3000 rpm
+* non-vaccum chuck: 5000 rpm
+|-
+|style="background:LightGrey; color:black"|Maximum acceleration
+|style="background:WhiteSmoke; color:black"|
+*5000 rpm/s
+|-
+| style="background:LightGrey; color:black"|Substrate size
+|style="background:WhiteSmoke; color:black"|
+* Maximum substrate size: 6"
+* Minimum substrate size: 3*3 mm2
+* maximum substrate thickness: 4 mm
+|-
+| style="background:LightGrey; color:black"|Allowed Substrate material
+|style="background:WhiteSmoke; color:black"|
+*III-V compound semiconductors
+*CMOS compatible materials
+|-
+|}