Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 136: | Line 136: | ||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |[[media:ZEP7000.pdf|ZEP7000.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. | |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. | ||
|IPA | |IPA | ||
|acetone/1165 | |acetone/1165 | ||