Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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 |style="background:LightGrey; color:black"|Resolution
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-*Minimum electron-beam size: 12 nm
+*Minimum electron-beam size: 12-30 nm depending on resist
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 |style="background:LightGrey; color:black"|Min. electron beam size
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-*10nm
+*5nm
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 |style="background:LightGrey; color:black"|Min. step size