Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 93: | Line 93: | ||
On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk]. | On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk]. | ||
= Process Flows = | = E-beam resists and Process Flows = | ||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="100%" | {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="100%" | ||