Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 230: | Line 230: | ||
== Proximity Error Correction (PEC) in BEAMER == | == Proximity Error Correction (PEC) in BEAMER == | ||
BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can ready more about this function in the BEAMER manual under Technical Documents [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here]. | BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can ready more about this function in the BEAMER manual under Technical Documents [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]]. | ||
The proximity error correction either require a forward and a backward range parameter, alfa and beta, and a ratio of backscattered energy to the forward scattered energy, eta. As alfa depends on the electron acceleration voltage, which is constant at 100kV, alfa is in BEAMER fixed to 0.007. Help to find beta and eta can be found [http://nanolithography.gatech.edu/proximity.htm here]. | |||
* trilayer flow, not tested | * trilayer flow, not tested | ||