Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 224: | Line 224: | ||
= Proximity Error Correction = | = Proximity Error Correction = | ||
* PEC in BEAMER | * PEC in BEAMER | ||
* trilayer flow, not tested | * trilayer flow, not tested | ||
[[http://avspublications.org/jvst/resource/1/jvstal/v19/i4/p1304_s1]] | |||
= Charge dissipating agent = | = Charge dissipating agent = | ||
* Al coating, FLOW | * Al coating, FLOW | ||
* ESPACER, no flow yet | * ESPACER, no flow yet | ||