Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|''' | |'''AR-N 7520''' | ||
|Negative | |Negative | ||
| | |AllResist | ||
| | |Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [[mailto:pxshi@danchip.dtu.dk Peixiong Shi]] for information. | ||
|[[media:AR-N7500-7520.pdf|AR-N7500-7520.pdf]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | |||
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