Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|Standard reists | |Standard reists | ||
|[[media:ZEP520A.pdf|ZEP520A.pdf]] | |[[media:ZEP520A.pdf|ZEP520A.pdf]] | ||
|SSE, Manual Spinner 1, III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | ||
|IPA | |IPA | ||
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|Low dose to clear. Used for trilayer (PEC-free) resist-stack. Please contact Lithography. | |Low dose to clear. Used for trilayer (PEC-free) resist-stack. Please contact Lithography. | ||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |[[media:ZEP7000.pdf|ZEP7000.pdf]] | ||
|Manual Spinner 1, III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | ||
|IPA | |IPA | ||
| Line 147: | Line 147: | ||
| | | | ||
| | | | ||
|Manual Spinner 1, III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
| MIBK:IPA (1:3), IPA:H2O | | MIBK:IPA (1:3), IPA:H2O | ||
|IPA | |IPA | ||
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|Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack. | |Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack. | ||
|[[media:AR_P617.pdf|AR_P617.pdf]] | |[[media:AR_P617.pdf|AR_P617.pdf]] | ||
|Manual Spinner 1, III-V | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|AR600-55, MIBK:IPA | |AR600-55, MIBK:IPA | ||
| | | | ||
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|Approved, not tested yet. Should work similar to ZEP520A. Please contcat Lithography. | |Approved, not tested yet. Should work similar to ZEP520A. Please contcat Lithography. | ||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | |[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | ||
|Manual Spinner 1, III-V | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|X AR 600-54/6, MIBK:IPA | |X AR 600-54/6, MIBK:IPA | ||
|H2O | |H2O | ||
| Line 187: | Line 187: | ||
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|III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|TMAH, AZ400K:H2O | |TMAH, AZ400K:H2O | ||
|H2O | |H2O | ||
| Line 201: | Line 201: | ||
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|III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|Ma-D333, TMAH, MIF726 | |Ma-D333, TMAH, MIF726 | ||
|H2O | |H2O | ||
| Line 214: | Line 214: | ||
|Not tested yet | |Not tested yet | ||
| | | | ||
|III-V Spinner | |[[Specific_Process_Knowledge/Lithography/Coaters#III-V Spinner|III-V Spinner]] | ||
|Mr Dev | |Mr Dev | ||
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