Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|Negative | |Negative | ||
|DOW Corning | |DOW Corning | ||
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|III-V Spinner | |III-V Spinner | ||
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|- | |- | ||
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|Negative | |Negative | ||
|Micro Resist | |Micro Resist | ||
|Standard negative resist | |Standard negative resist | ||
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|H2O | |H2O | ||
|acteone/O2 plasma | |acteone/O2 plasma | ||
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|- | |- | ||
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|III-V Spinner | |III-V Spinner | ||
|Mr Dev | |Mr Dev | ||
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|Not tested yet | |Not tested yet | ||
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|Manual Spinner 1, III-V Spinner | |||
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