Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="80%" | |||
|- | |||
|- | |||
|-style="background:silver; color:black" | |||
|'''Resist''' | |||
|'''Polarity''' | |||
|'''Manufacturer''' | |||
|'''Comments''' | |||
|'''Technical reports''' | |||
|'''Spinner''' | |||
|'''Developer''' | |||
|'''Rinse''' | |||
|'''Remover''' | |||
|'''Process flows (in docx-format)''' | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''ZEP520A''' | |||
|Positive | |||
|ZEON | |||
|Standard reists | |||
|[[media:ZEP520A.pdf|ZEP520A.pdf]] | |||
|SSE, Manual Spinner 1, III-V Spinner | |||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |||
|IPA | |||
|acetone/1165 | |||
|[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]] | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''ZEP7000''' | |||
|Positive | |||
|ZEON | |||
|Low dose to clear. Used for trilayer (PEC-free) resist-stack. Please contact Lithography. | |||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |||
|Manual Spinner 1, III-V Spinner | |||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | |||
|IPA | |||
|acetone/1165 | |||
|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''PMMA''' | |||
|Positive | |||
| | |||
| | |||
| | |||
|Manual Spinner 1, III-V Spinner | |||
| MIBK:IPA (1:3), IPA:H2O | |||
|IPA | |||
|acetone/1165/Pirahna | |||
| | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''MMA (AR-P 617.05)''' | |||
|Positive | |||
|AllResist | |||
|Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack. | |||
|[[media:AR_P617.pdf|AR_P617.pdf]] | |||
|Manual Spinner 1, III-V spinner | |||
|AR600-55, MIBK:IPA | |||
| | |||
|acetone/1165 | |||
|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''CSAR''' | |||
|Positive | |||
|AllResist | |||
|Approved, not tested yet. Should work similar to ZEP520A. Please contcat Lithography. | |||
|[[media:CSAR_62_and_process_chemicals.pdf|CSAR_62_and_process_chemicals.pdf]] | |||
|Manual Spinner 1, III-V spinner | |||
|X AR 600-54/6, MIBK:IPA | |||
|H2O | |||
| | |||
|[[media:Process_Flow_CSAR.docx|Process_Flow_CSAR.docx]] | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''HSQ (XR-1541)''' | |||
|Negative | |||
|DOW Corning | |||
| | |||
|III-V Spinner | |||
|TMAH, AZ400K:H2O | |||
|H2O | |||
| | |||
| | |||
| | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''ma-N 2403''' | |||
|Negative | |||
|Micro Resist | |||
|IPA | |||
|Standard negative resist | |||
| | |||
|III-V Spinner | |||
|Ma-D333, TMAH, MIF726 | |||
|H2O | |||
|acteone/O2 plasma | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|'''Mr EBL 6000''' | |||
|Micro Resist | |||
| | |||
|Not tested yet | |||
| | |||
|III-V Spinner | |||
|Mr Dev | |||
| | |||
| | |||
|- | |||
|-style="background:LightGrey; color:black" | |||
|'''AR-N 7520''' | |||
|Negative | |||
|AllResist | |||
|Not tested yet | |||
| | |||
| | |||
|Manual Spinner 1, III-V Spinner | |||
| | |||
| | |||
| | |||
|} | |} | ||