Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''Developer''' | |'''Developer''' | ||
|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene | |ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf|JJAP-51-06FC05.pdf]], [[media:JVB001037.pdf|JVB001037.pdf]] | ||
|ZED-N500/Hexyl Acetate,n-amyl acetate, oxylene | |ZED-N500/Hexyl Acetate,n-amyl acetate, oxylene | ||
|MIBK:IPA (1:3)/IPA:H2O | |MIBK:IPA (1:3)/IPA:H2O | ||