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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Comments'''
|'''Comments'''
|Standard positive resist. Technical Report to be found here: [[media:ZEP520A.pdf|ZEP520A.pdf]]
|Standard positive resist.
|Low dose to clear. Used for trilayer (PEC-free) resist-stack. Please contact Lithography. Technical Report to be found here: [[media:ZEP7000.pdf|ZEP7000.pdf]]
|Low dose to clear. Used for trilayer (PEC-free) resist-stack. Please contact Lithography.  
|Technical Report to be found here:
|
|Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack. Technical Report to be found here: [[media:AR_P617.pdf‎|AR_P617.pdf‎]]
|Approved, not tested yet. Used for trilayer (PEC-free) resist-stack or double-layer lift-off resist stack.  
|Approved, not tested yet. Should work quite similar as ZEP520A. Please contact Lithography. Technical Report to be found here:
|Approved, not tested yet. Should work quite similar as ZEP520A. Please contact Lithography.  
|Approved, not tested yet. Technical Report to be found here:
|Approved, not tested yet.  
|Standard negative resist
|Standard negative resist
|CC
|
|Negative resist to be tested soon.
|Negative resist to be tested soon.
|-
|-style="background:WhiteSmoke; color:black"
|'''Technical Report'''
|[[media:ZEP520A.pdf|ZEP520A.pdf]]
|[[media:ZEP7000.pdf|ZEP7000.pdf]]
|
|[[media:AR_P617.pdf‎|AR_P617.pdf‎]]
|
|
|
|
|




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