Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 94: | Line 94: | ||
= Process Flows = | = Process Flows = | ||
ZEP520A is used as a standard positive e-beam resist. A process flow for spinning, e-beam exposing and development of this resist can be downloaded here (word format): | |||
[[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]]. | [[media:Process_Flow_ZEP.docx|Process_Flow_ZEP.docx]]; please note, that the individual steps of the process flow should be optimised to your specific processing technique, this process flow thus being a guideline. | ||