Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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It is also recommended to gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use. | It is also recommended to gather as much knowledge about your e-beam run from your colleagues, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). In order to get an overview of what an e-beam process requires, it is recommended to a assist a fully trained colleague of yours when she or he e-beam writes. Furthermore, please read the e-beam manual for more information on which parameters to use. | ||
On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team at [mailto:e-beam@danchip.dtu.dk]. | |||
'''There are 3 [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&page_id=169 manuals] for the e-beam writer: | |||
* A user manual describing the standard procedure when e-beam writing | |||
* A jdf-, and sdf-file manual describing how to prepare sdf-, and jdf-files (found under 'Technical Documents') | |||
* A BEAMER manual describing how to convert your pattern file (GDSII-format) to v30-format (found under 'Technical Documents')''' | |||
= E-beam Spinner = | = E-beam Spinner = | ||