Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== Getting started == | === Getting started === | ||
[[Image:ebeam load.jpg|400x400px|thumb|'''Only DTU Danchip personnel is allowed to load or unload cassettes to or from the machine''']] | [[Image:ebeam load.jpg|400x400px|thumb|'''Only DTU Danchip personnel is allowed to load or unload cassettes to or from the machine''']] | ||
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'''On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team.''' | '''On the L-drive, a logbook for the e-beam writer can be found. Sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program; please use this prior to requesting e-beam sessions. If in doubt how to use it, contact the e-beam team.''' | ||
= E-beam Spinner = | |||
You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners | You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners | ||
<span class="plainlinks">[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters here]</span> (opens in a new tab). | <span class="plainlinks">[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters here]</span> (opens in a new tab). | ||