Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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-The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The maximum field-size without stitching is 1 mm x 1 mm. The machine is located in a class 10 cleanroom with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.
+The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam is around 12 nm, the maximum writitng field without stitching is 1 mm x 1 mm.
+The machine is located in a class 10 cleanroom (E-2) with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.
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 !style="background:silver; color:black;" align="left"|Purpose
 |style="background:LightGrey; color:black"|pattern an electron sensitive resist
-|style="background:WhiteSmoke; color:black"|Mainly for pattering structures with minimum feature size between 1 µm to 20nm
+|style="background:WhiteSmoke; color:black"|Mainly for pattering structures with minimum feature size between 20 nm - 1 µm
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
 |style="background:LightGrey; color:black"|Resolution
 |style="background:WhiteSmoke; color:black"|
-*Minimum e-beam size: 12 nm
+*Minimum electron-beam size: 12 nm
 |-
-|style="background:LightGrey; color:black"|Max. e-beamed area without stitching
+|style="background:LightGrey; color:black"|Maximum writing area without stitching
 |style="background:WhiteSmoke; color:black"|
 *1mm x 1mm