Specific Process Knowledge/Lithography/Coaters: Difference between revisions

@@ Line 151: / Line 151: @@
 Tested ?/5 2013 on 100nm oxide: 81.4°. Tested ?/6 2013 on 3µm oxide: 81.8°.
-'''AZ MiR 701 (29cps) coating:'''
+====AZ MiR 701 (29cps) coating====
 *T1 MiR 701 1,5um no HMDS
 *T1 MiR 701 1,5um with HMDS
@@ Line 160: / Line 160: @@
 *T1 MiR 701 2um with HMDS
-'''AZ nLOF 2020 coating:'''
+====AZ nLOF 2020 coating====
 *T2 nLOF 2020 2um no HMDS
 *T2 nLOF 2020 2um with HMDS
@@ Line 170: / Line 170: @@
 *T2 nLOF 2020 5um with HMDS
-'''Post-exposure baking:'''
+====Post-exposure baking====
 *T2 5214E image reversal bake
 *T2 MiR 701 PEB