Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

Revision as of 12:13, 13 June 2013 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits →Overview of the performance of the e-beam writer ← Older edit		Revision as of 12:14, 13 June 2013 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits No edit summary Newer edit →
Line 2:		Line 2:

	The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The maximum field-size without stitching is 1 mm x 1 mm. The machine is located in a class 10 cleanroom with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.		The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The maximum field-size without stitching is 1 mm x 1 mm. The machine is located in a class 10 cleanroom with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.

	The computer controlling the e-beam is located in the controller room which is a class 100 cleanroom area. The computers supporting the conversion of the e-beam files (DCH1350 or DCH1352) are also located in the controller room.