Specific Process Knowledge/Lithography/Coaters: Difference between revisions

← Older edit Newer edit →

VisualWikitext

@@ Line 100: / Line 100: @@
 ==Spin Track 1 + 2==
+'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/... click here]'''
+<!-- Replace "http://labadviser.danchip.dtu.dk/..." wih the link to the Labadviser page-->
-A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here. A lot of text here. A lot of text here. A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here. A lot of text here. A lot of text here.
+=== Name of equipment ===
-A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here. A lot of text here. A lot of text here. A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here.  A lot of text here. A lot of text here. A lot of text here.
+Write a short description of the equipment(s).
+'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:'''
+<!-- remember to remove the type of documents that are not present -->
+[[image:Cluster1.jpg|200x200px|right|thumb|Image(s) of the equipment(s)]]
+<!-- give the link to the equipment info page in LabManager: -->
+[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=316 LabManager]
+=== Process information ===
+Link to process pages - e.g. one page for each material
+Example:
+*[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Etch of silicon using RIE]]
+*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2|Etch of silicon oxide using RIE]]
+*[[Specific Process Knowledge/Etch/Etching of Silicon Nitride/Etch of Silicon Nitride using RIE|Etch of silicon nitride using RIE]]
+*[[Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE|Etch of photo resist using RIE]]
+=== Equipment performance and process related parameters ===
+{| border="2" cellspacing="0" cellpadding="2"
+!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
+|style="background:WhiteSmoke; color:black"|<b>Equipment 1</b>
+|style="background:WhiteSmoke; color:black"|<b>Equipment 2</b>
+|-
+!style="background:silver; color:black;" align="center" width="60"|Purpose
+|style="background:LightGrey; color:black"|
+|style="background:WhiteSmoke; color:black"|
+*Purpose 1
+*Purpose 2
+|style="background:WhiteSmoke; color:black"|
+*Purpose 1
+*Purpose 2
+*Purpose 3
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
+|style="background:LightGrey; color:black"|Response 1
+|style="background:WhiteSmoke; color:black"|
+*Performance range 1
+*Performance range 2
+|style="background:WhiteSmoke; color:black"|
+*Performance range 1
+*Performance range 2
+*Performance range 3
+|-
+|style="background:LightGrey; color:black"|Response 2
+|style="background:WhiteSmoke; color:black"|
+*Performance range
+|style="background:WhiteSmoke; color:black"|
+*Performance range
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
+|style="background:LightGrey; color:black"|Parameter 1
+|style="background:WhiteSmoke; color:black"|
+*Range
+|style="background:WhiteSmoke; color:black"|
+*Range
+|-
+|style="background:LightGrey; color:black"|Parameter 2
+|style="background:WhiteSmoke; color:black"|
+*Range
+|style="background:WhiteSmoke; color:black"|
+*Range
+|-
+!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
+|style="background:LightGrey; color:black"|Batch size
+|style="background:WhiteSmoke; color:black"|
+*<nowiki>#</nowiki> small samples
+*<nowiki>#</nowiki> 50 mm wafers
+*<nowiki>#</nowiki> 100 mm wafers
+*<nowiki>#</nowiki> 150 mm wafers
+|style="background:WhiteSmoke; color:black"|
+*<nowiki>#</nowiki> small samples
+*<nowiki>#</nowiki> 50 mm wafers
+*<nowiki>#</nowiki> 100 mm wafers
+*<nowiki>#</nowiki> 150 mm wafers
+|-
+| style="background:LightGrey; color:black"|Allowed materials
+|style="background:WhiteSmoke; color:black"|
+*Allowed material 1
+*Allowed material 2
+|style="background:WhiteSmoke; color:black"|
+*Allowed material 1
+*Allowed material 2
+*Allowed material 3
+|-
+|}
+<br clear="all" />
 ==KS Spinner==