Specific Process Knowledge/Wafer cleaning: Difference between revisions
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(New page: == Clean with: == *RCA - ''two step process to remove organics and metals'' *7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' *BHF - ''etching of predep gla...) |
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*7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' | *7-up - ''piranha etch of wafers and masks - removes organiscs and alkali ions'' | ||
*BHF - ''etching of predep glass'' | *BHF - ''etching of predep glass'' | ||
Revision as of 14:35, 4 October 2007
Clean with:
- RCA - two step process to remove organics and metals
- 7-up - piranha etch of wafers and masks - removes organiscs and alkali ions
- BHF - etching of predep glass