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Specific Process Knowledge/Thin film deposition/Electroplating-Ni: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, danchip
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Choi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, danchip
641 edits
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>Equipment 1</b>
|style="background:WhiteSmoke; color:black"|<b>Electroplating-Ni</b>
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!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
|style="background:LightGrey; color:black"|  
|style="background:LightGrey; color:black"|  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Purpose 1
Electrochemical deposition of nickel
*Purpose 2
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
|style="background:LightGrey; color:black"|Response 1
|style="background:LightGrey; color:black"|Thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Performance range 1
0 - 1400 µm
*Performance range 2


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|style="background:LightGrey; color:black"|Response 2
|style="background:LightGrey; color:black"|Uniformity
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Performance range
Around 10% (depending on sample and process)
   
   
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
|style="background:LightGrey; color:black"|Parameter 1
|style="background:LightGrey; color:black"|Temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Range
52*C


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|style="background:LightGrey; color:black"|Parameter 2
|style="background:LightGrey; color:black"|pH
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Range
3,5 - 4,0
   
   
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|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 1 x 50 mm wafer
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 1 x 100 mm wafer
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 1 x 150 mm wafer
*<nowiki>#</nowiki> 150 mm wafers


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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Allowed material 1
Most materials '''except copper and cobalt'''.
*Allowed material 2
*Ask Danchip for details.


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