Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
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[[image:Ellipsometer.jpg|275x275px|right|thumb|Ellipsometer: positioned in cleanroom 2]] | [[image:Ellipsometer.jpg|275x275px|right|thumb|Ellipsometer: positioned in cleanroom 2]] | ||
The ellipsometer VASE is a VASE (Variable Angle Spectroscopic Ellipsometry) ellipsometer from J.A. Woollam Co., Inc. | |||
The ellipsometer M2000V is a in-situ ellipsometer fraom J.A. Wollam Co., Inc. this is positioned on the Sputter System Lesker instrument for in-situ measurements. | |||
Ellipsometry is a very sensitive characterization technique which can be used to determine thin film layer thicknesses and/or optical constants. It sends in polarized light on the surface at different angles and measures the change in polarization state of the reflected light. | Ellipsometry is a very sensitive characterization technique which can be used to determine thin film layer thicknesses and/or optical constants. It sends in polarized light on the surface at different angles and measures the change in polarization state of the reflected light. | ||
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===A rough overview of the performance of the | ===A rough overview of the performance of the Ellipsometers=== | ||
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