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Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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Jehan (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891, Bureaucrats, danchip, Administrators
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Line 329: Line 329:
|Ta2O5|| 0,125"|| 99,900%
|Ta2O5|| 0,125"|| 99,900%
|-
|-
|AZO (ZnO/Al2O3)||   98%/2% 0,125"|| 99,99%
|AZO (ZnO/Al2O3) 98%/2% ||0,125"|| 99,99%
|-
|-
|ZnO|| 0.250"|| 99,999%
|ZnO|| 0.250"|| 99,999%
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Lesker"