Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon|Silicon (Si)]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon|Silicon (Si)]] | ||
*Iron (Fe) | *Iron (Fe) | ||
*+ many more (see list below or ask) | *+ many more ([[#List of available targets for the Sputter-System(Lesker) (03 June 2013)|see list below]] or ask) | ||
Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk). | Contact the pvd-group if you have special needs (pvd@danchip.dtu.dk). | ||
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==List of available targets for the Sputter-System(Lesker) (03 June 2013)== | ==List of available targets for the Sputter-System(Lesker) (03 June 2013)== | ||