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Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions

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Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.  
Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.  


'''The user manual and contact information can be found in LabManager:'''


<!--'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' -->
http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=changestatus&page_id=50
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<!--[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=18 LabManager]-->


==Overview of the performance of the Surfscan 6420 and some process related parameters==
==Overview of the performance of the Surfscan 6420 and some process related parameters==