Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions
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Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles. | Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles. | ||
'''The user manual and contact information can be found in LabManager:''' | |||
http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=changestatus&page_id=50 | |||
==Overview of the performance of the Surfscan 6420 and some process related parameters== | ==Overview of the performance of the Surfscan 6420 and some process related parameters== | ||