Jump to content

Specific Process Knowledge/Etch/ASE (Advanced Silicon Etch): Difference between revisions

Jml (talk | contribs)
No edit summary
Jml (talk | contribs)
No edit summary
Line 18: Line 18:
== Recipes on the ASE ==
== Recipes on the ASE ==


=== Shallolr ===
=== [[Shallolr]] ===


The shallolr recipe is designed to etch features (with sizes above 1 <math>\mu</math>m) in silicon down to a depth that ranges from a few microns to some 50 microns.
The shallolr recipe is designed to etch features (with sizes above 1 <math>\mu</math>m) in silicon down to a depth that ranges from a few microns to some 50 microns. If you need to etch deeper use [[Deepetch]] or more shallow, see [[Nanoetches]].


{| border="2" cellpadding="2" cellspacing="1" align="left"
{| border="2" cellpadding="2" cellspacing="1" align="left"
Line 70: Line 70:
| 5 s
| 5 s
|}
|}
== [[Deepetch]] ==


{| border="2" cellpadding="2" cellspacing="1" align="right"
{| border="2" cellpadding="2" cellspacing="1" align="right"