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Specific Process Knowledge/Etch/Wet Chromium Etch: Difference between revisions

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===Overview of the data for the chromium etches===
===Overview of the data for the chromium etches===
{| border="1" cellspacing="0" cellpadding="4"  
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
!
|-
 
|-
|-style="background:silver; color:black"
! Chromium etch 1
! Chromium etch 1
! Chromium etch 2
! Chromium etch 2
|-  
|-  
| '''General description'''
 
|-style="background:WhiteSmoke; color:black"
!General description
|
|
Etch of chromium
Etch of chromium
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Etch of chromium
Etch of chromium
|-
|-
| '''Link to safety APV and KBA'''
 
|-style="background:LightGrey; color:black"
!Link to safety APV and KBA
|[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see APV here].  
|[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see APV here].  
[http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 see KBA here]
[http://kemibrug.dk/KBA/CAS/107388/?show_KBA=1&portaldesign=1 see KBA here]
|[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see APV here]  
|[http://www.labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 see APV here]  
|-
|-
| '''Chemical solution'''
 
|-style="background:WhiteSmoke; color:black"
!Chemical solution
|Chrome Etch 18
|Chrome Etch 18
|HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate  - 90ml:1200ml:15g
|HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate  - 90ml:1200ml:15g
|-
|-
| '''Process temperature'''
 
|-style="background:LightGrey; color:black"
!Process temperature
|Room temperature
|Room temperature


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|-
|-


| '''Possible masking materials'''
|-style="background:WhiteSmoke; color:black"
!Possible masking materials
|Photoresist (1.5 µm AZ5214E)
|Photoresist (1.5 µm AZ5214E)
|Photoresist (1.5 µm AZ5214E)
|Photoresist (1.5 µm AZ5214E)
|-
|-
|'''Etch rate'''
 
|-style="background:LightGrey; color:black"
!Etch rate
|~ ? nm/min  
|~ ? nm/min  
|~40-100 nm/min  
|~40-100 nm/min  
|-
|-
|'''Batch size'''
 
|-style="background:WhiteSmoke; color:black"
!Batch size
|1-7 wafers at a time
|1-7 wafers at a time
|1-7 wafers at a time
|1-7 wafers at a time
|-
|-
|'''Size of substrate'''
 
|-style="background:LightGrey; color:black"
!Size of substrate
|4" wafers
|4" wafers
|4" wafers
|4" wafers
|-
|-
|'''Allowed materials'''
 
|-style="background:WhiteSmoke; color:black"
!Allowed materials
|No restrictions.  
|No restrictions.  
Make a note on the beaker of which materials have been processed.
Make a note on the beaker of which materials have been processed.
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