Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions
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==Process parameters for the two standard deposition recipes on the TEOS furnace:== | ==Process parameters for the two standard deposition recipes on the TEOS furnace:== | ||
{| border=" | {| border="1" cellspacing="0" cellpadding="0" | ||
!Recipe name | !Recipe name | ||
!Wafer size and number of wafers | !Wafer size and number of wafers | ||