Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/SiO2 disk and granule source tests in Temescal October 2026: Difference between revisions
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'''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [2 | '''Note.''' This report records exploratory tests rather than an operating instruction. Source coverage must be assessed during deposition; the absence of damage in one run does not establish that continued operation after breakthrough is acceptable. Use the current local operating procedures and tool-responsible guidance [1, 2]. | ||
=== Related local documentation === | === Related local documentation === | ||