Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions
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On the furnace there are also two standby recipes, which are used for wafer loading and unloading. One standby recipe is called "STANDBY". The other standby recipe is called "STB-SLOW", and this is being used, if a thicker TEOS oxide layer (> 1 µm) is deposited, because the furnace then has to open slower to avoid stress and thus cracks in the deposited film. | On the furnace there are also two standby recipes, which are used for wafer loading and unloading. One standby recipe is called "STANDBY". The other standby recipe is called "STB-SLOW", and this is being used, if a thicker TEOS oxide layer (> 1 µm) is deposited, because the furnace then has to open slower to avoid stress and thus cracks in the deposited film. | ||
==Process parameters | ==Process parameters standard deposition recipes and the standby recipes on the TEOS furnace:== | ||
{| border="1" cellspacing="0" cellpadding="4" | {| border="1" cellspacing="0" cellpadding="4" | ||
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|- | |- | ||
| "STANDBY" and "STB-SLOW" | | "STANDBY" and "STB-SLOW" | ||
(standby | (standby recipes) | ||
| 4" wafers | | 4" wafers | ||
1- | 1-15 wafers | ||
| 560 | | 560 <sup>o</sup>C | ||
(wafer loading temperature) | (wafer loading temperature) | ||
| Atmospheric pressure | | Atmospheric pressure | ||
| 0 | (wafer loading pressure) | ||
| 0 | | 0 sccm | ||
| 0 sccm | |||
| For wafer loading and unloading | | For wafer loading and unloading | ||
|- | |- | ||
| Line 55: | Line 56: | ||
(deposition recipe) | (deposition recipe) | ||
| 4" wafers | | 4" wafers | ||
1- | 1-15 wafers | ||
| 715, 712, 720 | | 715, 712, 720 <sup>o</sup>C | ||
(temperature zone 1, 2, 3) | (temperature zone 1, 2, 3) | ||
| 175 | | 175 mTorr | ||
| 50 | | 50 sccm. <i>The exact flow is not know - the setpoint is much lower than 50 sccm, but the MFC is not calibrated for TEOS</i> | ||
| 0 | | 0 sccm | ||
| Process recipe | | Process recipe | ||
|} | |} | ||
==Deposition rate and refractive index:== | ==Deposition rate and refractive index:== | ||