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Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3: Difference between revisions

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==X-ray Reflectivity (XRR)==
==X-ray Reflectivity (XRR)==
[[Specific Process Knowledge/Characterization/XRD/XRD_SmartLab|X-ray Reflectivity]] analysis of ScN samples have been performed to investigate the thicknesses, roughness, and density profiles.
The scans has been obtained using Rigaku XRD SmartLab equipment. The voltage and current settings for the Cu X-ray tube were standard  40kV and 30mA. The incident optics contained a IPS (incident parallel slit) adaptor with 5 ° Soller slit. Other slits: IS=0.05mm RS1=0.05mm and RS2=0.075mm. Step size: 0.01 and measurement time - 5s for each point. Fitting procesure was performed using commercial GlobalFit software assuming the model based on Si  substrate  followed by the deposited ScN film with thin oxides and moisture surfaces. The results are summarized in a tables below.


<gallery caption="X-ray reflectivity scans of ScN thin films (PC3 Src1). " widths="450px" heights="400px" perrow="3">
<gallery caption="X-ray reflectivity scans of ScN thin films (PC3 Src1). " widths="450px" heights="400px" perrow="3">
image:eves_XRR_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
image:eves_XRR_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
image:eves_XRR_ScN_3mTorr_1000s_150W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
image:eves_XRR_ScN_3mTorr_1000s_150W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 150W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
image:eves_XRR_ScN_3mTorr_1000s_100W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
image:eves_XRR_ScN_3mTorr_1000s_100W_PC3_Src1_RF_ext_20231013.png|ScN thin film XRR. Power: 100W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (95.20 mm).
</gallery>
</gallery>


<gallery caption="X-ray reflectivity scans of ScN thin films (PC3 Src1). " widths="450px" heights="400px" perrow="3">
<gallery caption="X-ray reflectivity scans of ScN thin films (PC3 Src1). " widths="450px" heights="400px" perrow="3">
image:eves_XRR_ScN_3mTorr_1000s_200W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (00.00 mm).
image:eves_XRR_ScN_3mTorr_1000s_200W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Home (00.00 mm).
image:eves_XRR_ScN_3mTorr_1000s_150W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (00.00 mm).
image:eves_XRR_ScN_3mTorr_1000s_150W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 150W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Home (00.00 mm).
image:eves_XRR_ScN_3mTorr_1000s_100W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 200W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Extended (00.00 mm).
image:eves_XRR_ScN_3mTorr_1000s_100W_PC3_Src1_RF_home_20231013.png|ScN thin film XRR. Power: 100W, Deposition time: 1000s, Pressure 3 mTorr. PC Gun Z-shift Position: Home (00.00 mm).
</gallery>
</gallery>


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