Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3: Difference between revisions
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==Scanning Electron | ==Scanning Electron Microscopy== | ||
The images below present SEM images of the ScN layers from the top and tilted view. | The images below present [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy |Scanning Electron Microscopy (SEM)]] images of the ScN layers from the top and tilted view. | ||
<gallery caption="Scanning Electron Microscopy." widths="480px" heights="400px" perrow="3"> | <gallery caption="Scanning Electron Microscopy." widths="480px" heights="400px" perrow="3"> | ||
image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image1_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Top view. | image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image1_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Top view. | ||
image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image2_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Tilted view. | image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image2_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Tilted view. | ||
image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image3_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Tilted view | image:eves_SEM_ScN_3mTorr_1000s_200W_PC3_Src1_RF_ext_image3_20231013.png| <b><span style="color: red">ScN</span></b> layer deposited at 200 W RF power, 3mTorr, and 1000s. Gun Z-shift position is "Extended". Tilted view | ||
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