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Specific Process Knowledge/Thin film deposition/Deposition of Scandium Nitride/ScN Reactive Sputtering in Cluster Lesker PC3: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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|<b>150W, 3mTorr, 1050s</b>   
|<b>150W, 3mTorr, 1000s</b>   
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|0.67
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|-  
|<b>150W, 3mTorr, 1050s</b>   
|<b>150W, 3mTorr, 1000s</b>   
|1.29
|1.29
|1.17
|1.17
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==X-ray Photoelectron Spectroscopy==
==X-ray Photoelectron Spectroscopy==
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