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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD: Difference between revisions

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|20HF 6s  
|20HF 6s  
20LF 2s
20LF 2s
|Low stress nitride - standard recipe
|Low stress nitride - standard recipe. The latest measured values can be seen in the process control sheet in LabManager.
|-
|-
|LFSiN
|LFSiN
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