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Specific Process Knowledge/Thin film deposition/Deposition of Platinum/Deposition of Pt in Sputter System (Lesker): Difference between revisions

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Created page with "=Pt Sputtering= This page presents the results of Pt deposition using <b>DC sputtering</b> in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target..."
 
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Measured thickness (by XRR) is 22.42 nm
Measured thickness (by XRR) is: <b>24.5 nm</b>


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* Deposition Rate: <b><span style="color: red">0.3737 nm/s</span></b>
* Deposition Rate: <b><span style="color: red">0.4078 nm/s</span></b>
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The characterization reveals a complex structure of the deposited layers. The best way to describe the samples is to implement the following model (shown in a figure). The Pt film contains a bottom intermediate layer with constant and relatively high electron density. On top of it, there is a main layer of Pt, where the density is a linear function of the depth. The highest density is at the top and the lowest at the bottom. The topmost layer contains moisture, where Pt bounds carbon and water. Appling this complexity allows fitting XRR data.
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X-ray reflectivity (XRR) profiles for Pt film has been obtained using Rigaku XRD SmartLab equipment with standard 2\theta / \omega scans. The voltage and current settings for the Cu X-ray tube were standard 40kV and 30mA. The incident optics contained a IPS (incident parallel slit) adaptor with 5 ° Soller slit. Other slits: IS=0.03mm RS1=0.03mm and RS2=0.075mm. Step size: 0.01 and measurement time - 5s for each point. Fitting procesure was performed using commercial GlobalFit software assuming the model based on Si substrate with native oxide followed by the deposited complex Pt film illustrated on a model figure. The results are summarized in a tables below.
{| border="2" cellspacing="2" cellpadding="5"  align="center"
|-
!colspan="8" border="none" style="background:silver; color:black;" align="center"| Layer parameter list
|-
|style="background:WhiteSmoke; color:black"|<b>Layer name</b>
|style="background:WhiteSmoke; color:black"|<b>Thickness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Density (g/cm<sup>3</sup>)</b>
|style="background:WhiteSmoke; color:black"|<b>Rougness (nm)</b>
|style="background:WhiteSmoke; color:black"|<b>Depth distribution</b>
|style="background:WhiteSmoke; color:black"|<b>Bottom density (g/cm<sup>3</sup>)</b>
|style="background:WhiteSmoke; color:black"|<b>Delta</b>
|style="background:WhiteSmoke; color:black"|<b>Beta</b>
|-
|<b>Moisture</b>
|<b>3.72</b>
|2.69
|1.06
|No distribution
|
|style="background:WhiteSmoke; color:black"|8.7428e-6
|style="background:WhiteSmoke; color:black"|2.0302e-7
|-
|<b>Pt</b>
|<p style="color:red;"><b>23.39</b></p>
|18.75
|0.38
|Linear
|2.03
|style="background:WhiteSmoke; color:black"|6.0385e-5
|style="background:WhiteSmoke; color:black"|6.2659e-7
|-
|<b>Pt intermediate layer</b>
|<p style="color:red;"><b>1.078</b></p>
|6.60
|0.39
|No distribution
|
|style="background:WhiteSmoke; color:black"|2.1479e-5
|style="background:WhiteSmoke; color:black"|4.9878e-7
|-
|<b>SiO<sub>2</sub> native oxide</b>
|2.16
|1.75
|0.52
|No distribution
|
|style="background:WhiteSmoke; color:black"|5.7113e-6
|style="background:WhiteSmoke; color:black"|1.3262e-7
|-
|<b>Si wafer</b>
|<math>\infty</math>
|2.328
|0.04
|No distribution
|
|style="background:WhiteSmoke; color:black"|7.5795e-6
|style="background:WhiteSmoke; color:black"|1.7601e-7
|}
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<gallery caption="XRR analysis of Pt thin film." widths="500px" heights="500px" perrow="2">
image:eves_Pt_sample_model_20220120.png| Pt sample model.
image:eves_Pt_old_lesker_250W_2021_short.png| X-ray reflectivity. Measurement and Fit.
</gallery>
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