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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Oxide/Deposition_of_Silicon_Oxide_using_Lesker_sputter_tool click here]'''
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=Sputter deposition of SiO<sub>2</sub> using Sputter System (Lesker)=
=Sputter deposition of SiO<sub>2</sub> using Sputter-System (Lesker)=


SiO<sub>2</sub> can be sputter deposited with RF bias in the Sputter System (Lesker). You will find information on the pressure, max power to use and expected deposition rate on the [[Specific_Process_Knowledge/Thin_film_deposition/Lesker|Equipment page]] here in LabAdviser. To see the deposition parameters used by others, look in the [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&machid=244 Process Log] in LabManager.  
SiO<sub>2</sub> can be sputter deposited with RF bias in the Sputter-System (Lesker). You will find information on the pressure, max power and expected deposition rate on the [[Specific_Process_Knowledge/Thin_film_deposition/Lesker|Equipment page]] here in LabAdviser. To see the deposition parameters used by others, look in the [http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&machid=244 Process Log] in LabManager.  


Below you will find the deposition parameters and results of a study on the  surface roughness and oxide insulation quality of the deposited films.
Below you will find the deposition parameters and results of a study on the  surface roughness and oxide insulation quality of the deposited films.
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