Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 24: | Line 24: | ||
Thin Film group <i><u>thinfilm@nanolab.dtu.dk</u></i> is responsible | Thin Film group <i><u>thinfilm@nanolab.dtu.dk</u></i> is responsible for the equipment. | ||
Target/Metal requests should be sent to <i><u>metal@nanolab.dtu.dk</ | Target/Metal requests should be sent to <i><u>metal@nanolab.dtu.dk</u></i>. | ||
If you need a training on the machine please send your request to: <i><u>training@nanolab.dtu.dk</ | If you need a training on the machine please send your request to: <i><u>training@nanolab.dtu.dk</u></i>. | ||