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Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 626: Line 626:
There are dedicated recipes to turn on a heater:
There are dedicated recipes to turn on a heater:


  *  If PC1 is used, select “Master Heater PC1 - On”
*  If PC1 is used, select “Master Heater PC1 - On”


  *  If PC3 is used, select “Master Heater PC3 - On”
*  If PC3 is used, select “Master Heater PC3 - On”
 
 


==Substrate Cleaning (RF Bias)==
==Substrate Cleaning (RF Bias)==
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